منابع مشابه
Steady-state dissolution kinetics of aluminum-goethite in the presence of desferrioxamine-B and oxalate ligands.
This paper reports steady-state dissolution rates of synthetic low-substitution Al-goethites (mol % Al < 10) at pH 5 in the presence of the trihydroxamate siderophore, desferrioxamine B (DFO-B), and the common biological ligand, oxalate. The siderophore-promoted Fe release rate increased both with the level of Al substitution and with DFO-B concentration up to about 100 microM, after which a pl...
متن کاملMechanism and kinetics of aluminum dissolution during copper sorption by acidity paddy soil in South China.
Soil aggregates were prepared from a bulk soil collected from paddy soil in the Taihu Lake region and aluminum (Al) dissolution, solution pH changes during copper (Cu(2+)) sorption were investigated with static sorption and magnetic stirring. Kinetics of Cu(2+) sorption and Al dissolution were also studied by magnetic stirring method. No Al dissolution was observed until Cu(2+) sorption was gre...
متن کاملDissolution of amorphous silicon into solid aluminum
Metal films are known to dissolve crystalline semiconductors at temperatures well below the eutectic temperature. Dissolution and transport of common semiconductors in contact with Au films have been demonstrated at room temperature. 1 The solid AI metallization used in electronic devices is known to dissolve troublesome quantities of crystalline Si after heat treatment at 400oC.2 Metal films a...
متن کاملRegeneration of Caustic Soda Etch Solutions for Aluminum
A system for the regeneratlon of caustic soda solutlons used In etching aluminum Invokes the hydrolysis of sodium aluminate to llberate free sodium hydroxide and produce a dry, crystalllne hydrated alumlna byproduct. The system has been used extenslvely In Japan, and, by adjusting process parameters, can be adapted to North American practice. By otlllting the system in a typical plant, soild ai...
متن کاملThickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication
A novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), is developed. The etching area can be defined photolithographically on the exposed substrate. Utilizing galvanic displacement as well as selective etching process after photolithographic process, we simply and uniformly achieve self-controlled etch rate of 32.2±2.1nm/times through whole wafer level. MPOM pro...
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ژورنال
عنوان ژورنال: Journal of The Electrochemical Society
سال: 2000
ISSN: 0013-4651
DOI: 10.1149/1.1394026